Procopios Constantinou, Taylor J. Z. Stock, Li-Ting Tseng, Dimitrios Kazazis, Matthias Muntwiler, Carlos A. F. Vaz, Yasin Ekinci, Gabriel Aeppli, Neil J. Curson, and Steven R. Schofield
Unleashing the power of extreme-ultraviolet (EUV) light, scientists from UCL and the Paul Scherrer Institute, EPFL, and ETHZ in Switzerland have devised an innovative technique for patterning hydrogen-terminated silicon, charting a course towards the large-scale fabrication of quantum devices in silicon.
Procopios Constantinou et al. EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning. Nat Commun 15, 694 (2024). https://doi.org/10.1038/s41467-024-44790-6