prof claire carmalt

Profile Image
  • Prof
  • Claire
  • Jane
  • Carmalt
  • Prof Claire Carmalt
  • Ex: 27528
  • 1997-10-01
Joined UCL
  • 1997-10-01

Research Summary

We are interested in developing innovative new routes to inorganic materials via chemical vapour deposition (CVD). The research involves the synthesis of molecular precursors to a range of materials including transition metal nitrides, selenides and Group III nitrides and oxides. The aim is to develop new highly volatile, non-toxic CVD precursors, which are then used to grown thin-films via low-pressure, and aerosol-assisted CVD.
Research Activities
  • 2085
  • Aerosol-assisted chemical vapour deposition
  • 2416
  • Atmospheric Pressure chemical vapour deposition (APCVD)
  • 2086
  • Low Pressure chemical vapour deposition
  • 2084
  • Synthesis of Molecular Precursors
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Academic Background

  • Award Year
  • 1995
    Doctor of Philosophy
    University of Newcastle upon Tyne
  • 1992
    BSc Hons
    Bachelor of Science (Honours)
    University of Newcastle upon Tyne


Claire Carmalt graduated from the University of Newcastle upon Tyne with a first-class honours degree in chemistry in 1992. She remained at Newcastle to do her PhD with Dr Nick Norman on 'Synthetic and structural studies involving the heavier elements of groups 13 and 15'. She then spent just over two years as a postdoctoral fellow at the Science and Technology Center, University of Texas at Austin under the supervision of Professors Alan Cowley FRS and Mike White. Her postdoctoral work, which involved the synthesis of novel precursors for thin film growth, stimulated her interest in materials chemistry. In 1997, she was awarded a Royal Society Dorothy Hodgkin Fellowship and she moved to University College London. She started a lectureship at UCL in 2001 and was promoted to senior lecturer in 2002, Reader in 2004 and Professor in 2009. She was awarded the RSC 2000 Meldola Medal and Prize for her work in materials chemistry. Her group's research is now based around the application of organometallic chemistry to problems in materials deposition, most notably in connection with the development of "designed" molecular precursors targeted for thin film growth by chemical vapour deposition (CVD).

Additional Information
  • Alkoxide complexes
  • Amido complexes
  • CMR
  • Chemical vapour deposition
  • Main group chemistry
  • Materials
  • Transition metal chemistry
  • IPPAR53
  • prof ivan parkin